Inline film thickness measurement
This high performing measurement method uses white light interferometry, where a low pass filter blocks all light from 450 nm and below to protect photoresist from being exposed.
- In-situ film thickness measurement in real-time enables immediate quality control and yield monitoring.
- High speed wafer mapping with a programmable x-y stage can provide relevant data input towards root cause analysis of coating failures.
The high performing measurement method uses white light interferometry, where a low pass filter blocks all light from 450 nm and below to protect photoresist from being exposed.
![inline-thickness](https://www.obducat.com/wp-content/uploads/2020/09/inline-thickness-600x400.jpg)