OBDUCAT, the leading manufacturer of lithography solutions based on nanoimprint lithography (NIL), has received an order from DGIST, a research-oriented university and research institute in Daegu, Korea, for the supply of an EITRE® 6 NIL system. The EITRE system will be installed in the Device Cleanroom at the Center for Core Research Facilities. The EITRE [...]

OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography (NIL), has received an order from IMDEA-Nanociencia Institute in Madrid, Spain for the supply of an EITRE® 3 NIL system. The EITRE system has been purchased by IMDEA-Nanociencia Institute and will be installed in the Institute’s Nanofabrication Lab. The Eitre system will be used in [...]

OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography (NIL), confirms that the customer has signed the SAT (Site Acceptance Test) for the Sindre 400® NIL-system. Obducat and the customer signed a contract in January 2014 concerning the supply of a Sindre 400 NIL system to be used in mass production of µPSS LEDs. [...]

OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography (NIL), has received an order for the supply of an EITRE® 3 NIL system to the well renowned University College London in the UK. The EITRE system has been purchased by Department of Electronic & Electrical Engineering at University College London. The system will be [...]

OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography (NIL), has received an order for the supply of an EITRE® 6 NIL system to the highly regarded University of Cambridge in the UK. The EITRE system has been purchased by the Department of Engineering at University of Cambridge and it will be installed at [...]

OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography (NIL), has signed a contract concerning the supply of an EITRE® 6 NIL system to the highly regarded Wuhan University (WHU), China. The EITRE system will be installed in the Center of Nanoscience and Nanotechnology Research at Wuhan University which is considered to be among [...]

OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography (NIL), has been invited to participate in a transnational project named MOSAICS. The project has been initiated by the European collaboration organization eurostarsTM. The project is focused on the development and commercialization of Dye-sensitized Solar Cell’s (DSSC) with a special emphasis on smart windows and [...]

OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography (NIL), has received an order for the supply of an EITRE® 3 NIL system to the renowned Universidad Nacional Autónoma de México (UNAM). The order value is approx. 1.6 MSEK. The EITRE system has been purchased by the Facultad de Ciencias, UNAM and it will [...]

OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography (NIL), have signed a collaboration agreement with Institute of Advanced Technology (IAT) at University of Science and Technology of China (USTC), Hefei, China. The collaboration agreement focus on development of next generation of LED technology. USTC placed an order for an Eitre® 6 NIL system [...]

OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography (NIL), have received delivery approval, after performing the FAT (Factory Acceptance Test), of the SINDRE® 400 NIL system that was ordered by an Asian customer earlier this year. Installation at customer site is planned to be performed during January. The delivery approval represents an important [...]