OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography (NIL), has signed a contract concerning the supply of an EITRE® 3 NIL system to Yamagata University in Japan. The order value is approx. 1.4 MSEK. The EITRE system will be installed at the “Frontier Center for Organic System Innovations” that will start its operations [...]

OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography (NIL), has signed a contract concerning the supply of an EITRE® 6 NIL system to University of Science and Technology of China (USTC). The order value is 400 KEUR, which was included in the order take in Q2 reporting. The EITRE system will be installed [...]

OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography (NIL), has signed a contract concerning supply of an EITRE® 6 NIL system to City University of Hong Kong. The order value is 3 million HK$. The EITRE system will be used in Professor Stella Pang’s research work at the Department of Electronic Engineering at [...]

OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography, has been invited to participate in an EU funded project, named GREENANOFILM. The project is focused on development and application of ultra-high resolution nano-organized films for next generation opto- and bio-electronics.Current knowledge in modern material science allows for the preparation of a myriad of tailored [...]

OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography (NIL), has signed a contract concerning supply of a Sindre® 400 NIL system to be used in mass production of µPSS LEDs. The expected revenue value from the contract, which includes the NIL system, consumables as well as service and support during the next two [...]

OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography has completed the installation of the “first-of-its-kind” NIL pilot line at Kimberly-Clark facilities in the US.Obducat and Kimberly-Clark entered into a Joint Development Agreement in June 2011. In May 2013 Kimberly-Clark placed a purchase order for a Sindre NIL pilot manufacturing line with Obducat.In November [...]

OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography and electron beam lithography, coordinates a transnational project, named ANILP, initiated through eurostarsTM. The project was given ranking no. 10 out of 510 eligible applications by the independent evaluation panel. The project is focused on developing a new manufacturing platform for advanced nano patterning on [...]

OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography and electron beam lithography, participates in a transnational project, named MATSENS, initiated through the collaboration network M-ERA.NET. The project is focused on developing new “smart” materials for electrochemical sensors.Biosensor and microfluidic technologies are a key topic for the development of new Point-of-Care (POC) analysis system [...]

OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography and electron beam lithography, has received an order for a Sindre pilot manufacturing line from Kimberly-Clark Corporation valued at 13.5 MSEK.Obducat and Kimberly-Clark entered into a Joint Development Agreement in June 2011. Based on the successful joint development efforts the parties have signed a Purchase [...]

OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography and electron beam lithography, has signed a joint development agreement with Kimberley-Clark Corporation.The target of the collaboration is to create a pilot scale NIL (Nano Imprint Lithography) solution to produce unique Kimberly-Clark devices. The application will remain undisclosed for the time being. A ramp into [...]