Obducat: Obducat to lead consortium for development of world’s first large area Nano Imprint Lithography solution
OBDUCAT, leading manufacturer of lithography solutions based on nanoimprint lithography and electron beam lithography, coordinates a transnational project, named ANILP, initiated through eurostarsTM. The project was given ranking no. 10 out of 510 eligible applications by the independent evaluation panel. The project is focused on developing a new manufacturing platform for advanced nano patterning on [...]