Temperature controlled resist and chemical lines

Photoresist
Coating uniformity is dependent on various parameters. One such key parameters is photoresist temperature. To enable a high level of coating uniformity, the tool can be equipped with a temperature-controlled photoresist line that will enable a repeatable temperature level of the photoresist substrate-to-substrate at point of dispense.

Developer and chemicals
Developers and other processing chemicals react and perform differently with changes in temperature. This can generate undesired variations in processing results. When chemicals are supplied from the wafer fab or stored outside the cleanroom where temperatures are different to the cleanroom environment. This option can ensure a repeatable temperature level of the developer or chemicals substrate-to-substrate at point of dispense.